Wu, L. ; Tao, R. ; Basaran, U. ; Luger, J. ; Dettmann, I. ; Berroth, M. (2004) The Integrated 2W High Voltage/High Power 0.12-µm RF CMOS Power Amplifier. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, Amsterdam.
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Abstract
A 2W HiVP power amplifier for GSM mobile communication system is designed using 0.12-µm CMOS process. To solve the problem of low breakdown voltage in deep-submicron CMOS technology, the new High Voltage/High Power (HiVP) device configuration is used. With HiVP configuration, a large voltage can be divided by several devices, so that the voltage drop on each device is reduced. Hence the low-cost CMOS technology can be adopted for the design of power amplifier which will be used in a mobile phone. In this paper, an analytical overview of theory and practice of the HiVP power amplifier are discussed.
| Document type: | Conference or Workshop Item (Paper) |
|---|---|
| Subjects: | Area 09 - Ingegneria industriale e dell'informazione > ING-INF/01 Elettronica |
| Depositato da: | CIB Staff |
| Depositato il: | 15 Jun 2005 |
| Last modified: | 16 May 2011 13:39 |
Solo per lo Staff dell Archivio: Gestione del documento

