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The Integrated 2W High Voltage/High Power 0.12-µm RF CMOS Power Amplifier

Wu, L. ; Tao, R. ; Basaran, U. ; Luger, J. ; Dettmann, I. ; Berroth, M. (2004) The Integrated 2W High Voltage/High Power 0.12-µm RF CMOS Power Amplifier. In: Gallium Arsenide applications symposium. GAAS 2004, 11—12 Ottobre, Amsterdam.

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Abstract

A 2W HiVP power amplifier for GSM mobile communication system is designed using 0.12-µm CMOS process. To solve the problem of low breakdown voltage in deep-submicron CMOS technology, the new High Voltage/High Power (HiVP) device configuration is used. With HiVP configuration, a large voltage can be divided by several devices, so that the voltage drop on each device is reduced. Hence the low-cost CMOS technology can be adopted for the design of power amplifier which will be used in a mobile phone. In this paper, an analytical overview of theory and practice of the HiVP power amplifier are discussed.

Document type:Conference or Workshop Item (Paper)
Subjects:Area 09 - Ingegneria industriale e dell'informazione > ING-INF/01 Elettronica
Depositato da:CIB Staff
Depositato il:15 Jun 2005
Last modified:16 May 2011 13:39

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